SAN JOSE, Calif. — Applied Materials Inc. is quietly exiting the electron-beam and laser pattern-generation equipment markets, ending a painful and loss-ridden period in the competitive sectors, ...
The new high-throughput maskless tool developed at DARPA, achieves high throughput through the simultaneous deployment of 1 million parallel electron beamlets. Illustration: DARPA DARPA said its ...
A new low-cost, high-resolution tool is primed to revolutionize how nanotechnology is produced from the desktop, according to a new study by Northwestern University researchers. “With this ...
A new beam pattern devised by University of Rochester researchers could bring unprecedented sharpness to ultrasound and radar images, burn precise holes in manufactured materials at a nano scale -- ...
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